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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Rapid recipe formulation for plasma etching of new materials
Capodieci, Luigi, Cain, Jason P., Chopra, Meghali, Zhang, Zizhuo, Ekerdt, John, Bonnecaze, Roger T.Volume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2219171
File:
PDF, 617 KB
english, 2016