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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Next generation of decision making software for nanopatterns characterization: application to semiconductor industry
Sanchez, Martha I., Ukraintsev, Vladimir A., Dervilllé, A., Labrosse, A., Zimmermann, Y., Foucher, J., Gronheid, Roel, Boeckx, C., Singh, Arjun, Leray, Philippe, Halder, SandipVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219378
File:
PDF, 2.70 MB
english, 2016