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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Process window and defect monitoring using high-throughput e-beam inspection guided by computational hot spot detection
Sanchez, Martha I., Ukraintsev, Vladimir A., Wang, Fei, Zhang, Pengcheng, Fang, Wei, Liu, Kevin, Jau, Jack, Wang, Lester, Wan, Alex, Hunsche, Stefan, Halder, Sandip, Leray, PhilippeVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219515
File:
PDF, 3.06 MB
english, 2016