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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists
Hohle, Christoph K., Younkin, Todd R., Siauw, Meiliana, Du, Ke, Valade, David, Trefonas, Peter, Thackeray, James W., Whittaker, Andrew, Blakey, IdrissVolume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2219638
File:
PDF, 719 KB
english, 2016