SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advanced Etch Technology for Nanopatterning V - PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application
Lin, Qinghuang, Engelmann, Sebastian U., Sarrazin, A., Posseme, N., Pimenta-Barros, P., Barnola, S., Claveau, G., Gharbi, A., Argoud, M., Chamiot-Maitral, G., Tiron, R., Nicolet, C., Navarro, C., CardVolume:
9782
Year:
2016
Language:
english
DOI:
10.1117/12.2220586
File:
PDF, 1.35 MB
english, 2016