SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections
Erdmann, Andreas, Kye, Jongwook, Kubis, Michael, Wise, Rich, Reijnen, Liesbeth, Viatkina, Katja, Jaenen, Patrick, Luca, Melisa, Mernier, Guillaume, Chahine, Charlotte, Hellin, David, Kam, Benjamin, SoVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2220591
File:
PDF, 3.97 MB
english, 2016