![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advanced Etch Technology for Nanopatterning V - Edge roughness characterization of advanced patterning processes using power spectral density analysis (PSD)
Lin, Qinghuang, Engelmann, Sebastian U., Levi, Shimon, Schwarzband, Ishai, Kris, Roman, Adan, Ofer, Shi, Elly, Zhang, Ying, Zhou, KevinVolume:
9782
Year:
2016
Language:
english
DOI:
10.1117/12.2220814
File:
PDF, 623 KB
english, 2016