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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - An integrated source/mask/DSA optimization approach
Erdmann, Andreas, Kye, Jongwook, Fühner, Tim, Michalak, Przemysław, Welling, Ulrich, Orozco-Rey, Juan Carlos, Müller, Marcus, Erdmann, AndreasVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2222170
File:
PDF, 1.69 MB
english, 2016