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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Line edge roughness frequency analysis for SAQP process
Erdmann, Andreas, Kye, Jongwook, Sun, Lei, Zhang, Xiaoxiao, Levi, Shimon, Ge, Adam, Zhou, Hua, Wang, Wenhui, Krishnan, Navaneetha, Chen, Yulu, Verduijn, Erik, Kim, Ryoung-hanVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2229176
File:
PDF, 771 KB
english, 2016