![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Sanchez, Martha I., Ukraintsev, Vladimir A., Constantoudis, Vassilios, Kuppuswamy, Vijaya-Kumar M., Gogolides, Evangelos, Pret, Alessandro V., Pathangi, Hari, Gronheid, RoelVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2230849
File:
PDF, 6.10 MB
english, 2016