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Electroreflectance spectroscopy study of hydrogen plasma immersion ion implanted silicon with ultrathin oxide film
Alexandrova, S, Szekeres, A, Holiney, R Yu, Matveeva, LVolume:
253
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/253/1/012037
Date:
November, 2010
File:
PDF, 468 KB
english, 2010