SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Hohle, Christoph K., Younkin, Todd R., Stowers, Jason, Anderson, Jeremy, Cardineau, Brian, Clark, Benjamin, De Schepper, Peter, Edson, Joseph, Greer, Michael, Jiang, Kai, Kocsis, Michael, Meyers, StepVolume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2219527
File:
PDF, 2.56 MB
english, 2016