Reactive-ion etch resistant polysulfones for...

Makromolekulare Chemie Macromolecular Symposia 1992 / 01 Vol. 53; Iss. 1

Reactive-ion etch resistant polysulfones for microlithography

Bowden, Murrae J., Gozdz, Antoni S., DeSimone, Joseph M., McGrath, James E., Ito, Seiki, Matsuda, Minoru
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Volume:
53
Language:
english
Journal:
Makromolekulare Chemie. Macromolecular Symposia
DOI:
10.1002/masy.19920530113
Date:
January, 1992
File:
PDF, 813 KB
english, 1992
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