A process to fabricate micro‐membrane of Si...

Sensor Review 2006 / 07 Vol. 26; Iss. 3

A process to fabricate micro‐membrane of Si 3 N 4 and SiO 2 using front‐side lateral etching technology

koschan, Andreas, Alvi, P.A., Lourembam, B.D., Deshwal, V.P., Joshi, B.C., Akhtar, J.
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Volume:
26
Language:
english
Journal:
Sensor Review
DOI:
10.1108/02602280610675456
Date:
July, 2006
File:
PDF, 383 KB
english, 2006
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