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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Modeling acid transport in chemically amplified resist films
Wallow, Thomas I., Hohle, Christoph K., Patil, Abhijit A., Doxastakis, Manolis, Stein, Gila E.Volume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046473
File:
PDF, 251 KB
english, 2014