SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improving scanner wafer alignment performance by target optimization
Sanchez, Martha I., Ukraintsev, Vladimir A., Leray, Philippe, Jehoul, Christiane, Socha, Robert, Menchtchikov, Boris, Raghunathan, Sudhar, Kent, Eric, Schoonewelle, Hielke, Tinnemans, Patrick, Tuffy,Volume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219491
File:
PDF, 871 KB
english, 2016