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Process Optimization for SiGe pMOSFETs Using Low Temperature Oxides on Ultra-thin Cap Layers
Johansson, M, Yousif, M Y A, Lundgren, P, Bengtsson, SVolume:
T114
Language:
english
Journal:
Physica Scripta
DOI:
10.1088/0031-8949/2004/t114/024
Date:
January, 2004
File:
PDF, 146 KB
english, 2004