Contact photolithography using a carbon-black embedded soft...

Contact photolithography using a carbon-black embedded soft photomask and ultraviolet light emitting diodes with application on patterned sapphire substrates

Hsieh, Heng, Wu, Chun-Ying, Lee, Yung-Chun
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Volume:
24
Language:
english
Journal:
Optics Express
DOI:
10.1364/OE.24.008620
Date:
April, 2016
File:
PDF, 3.17 MB
english, 2016
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