SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Efficient full-chip mask 3D model for off-axis illumination
Zhang, Hongbo, Yan, Qiliang, Zhang, Lin, Croffie, Ebo, Brooker, Peter, Ren, Qian, Fan, Yongfa, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2026650
File:
PDF, 1.23 MB
english, 2013