Effect of Ti Sputtering Current on Structure of TiCrN Thin...

Key Engineering Materials 2016 / 1 Vol. 675-676

Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

Witit-Anun, Nirun, Teekhaboot, Amphol
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Volume:
675-676
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/kem.675-676.181
Date:
January, 2016
File:
PDF, 1.12 MB
english, 2016
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