The effect of the hydrofluoric acid etchant–silicon system...

Doklady Chemistry 2015 / 9 Vol. 464; Iss. 1

The effect of the hydrofluoric acid etchant–silicon system anisotropy on the shape of pores formed upon electrochemical etching of silicon

Abramova, E. N., Khort, A. M., Syrov, Yu. V., Yakovenko, A. G., Shvets, V. I.
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Volume:
464
Language:
english
Journal:
Doklady Chemistry
DOI:
10.1134/s0012500815090025
Date:
September, 2015
File:
PDF, 1.47 MB
english, 2015
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