Nano-modification of Si-wafer surfaces using low-cost...

International Journal of Nanomanufacturing 2015 Vol. 11; Iss. 5/6

Nano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma

Homola, Tomáš, Prysiazhnyi, Vadym, Stupavská, Monika
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Volume:
11
Year:
2015
Language:
english
Journal:
International Journal of Nanomanufacturing
DOI:
10.1504/ijnm.2015.075226
File:
PDF, 321 KB
english, 2015
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