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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Extension of practical k1 limit in EUV lithography
Panning, Eric M., Goldberg, Kenneth A., Park, Sarohan, Lee, Inwhan, Koo, Sunyoung, Lee, Jugnhyung, Lim, Chang-MoonVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219546
File:
PDF, 1.56 MB
english, 2016