SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Source mask optimization using 3D mask and compact resist models
Erdmann, Andreas, Kye, Jongwook, El-Sewefy, Omar, Chen, Ao, Lafferty, Neal, Meiring, Jason, Chung, Angeline, Foong, Yee Mei, Adam, Kostas, Sturtevant, JohnVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2220011
File:
PDF, 960 KB
english, 2016