Dry etching and residue removal of functional polymer mixed...

Dry etching and residue removal of functional polymer mixed with TiO 2 microparticles via inductively coupled CF 4 /O 2 plasma and ultrasonic-treated acetone for humidity sensor application

Liu, Ming-Qing, Wang, Cong, Yao, Zhao, Kim, Nam-Young
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Volume:
6
Year:
2016
Language:
english
Journal:
RSC Adv.
DOI:
10.1039/C6RA07688B
File:
PDF, 1.09 MB
english, 2016
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