SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Scanning scattering contrast microscopy for actinic EUV mask inspection
Sanchez, Martha I., Ukraintsev, Vladimir A., Mohacsi, I., Helfenstein, P., Rajendran, R., Ekinci, Y.Volume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2220027
File:
PDF, 1.07 MB
english, 2016