The Performance Improvement of N2 Plasma Treatment on ZrO2...

The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel

Wu, Chien-Hung, Huang, Bo-Wen, Chang, Kow-Ming, Wang, Shui-Jinn, Lin, Jian-Hong, Hsu, Jui-Mei
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Volume:
16
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.12612
Date:
June, 2016
File:
PDF, 1.47 MB
english, 2016
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