Accurate lifetime prediction for channel hot carrier stress...

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Microelectronics Reliability 2016 / 5

Accurate lifetime prediction for channel hot carrier stress on sub-1nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer

Luo, Weichun, Yang, Hong, Wang, Wenwu, Xu, Yefeng, Tang, Bo, Ren, Shangqing, Xu, Hao, Wang, Yanrong, Qi, Luwei, Yan, Jiang, Zhu, Huilong, Zhao, Chao, Chen, Dapeng, Ye, Tianchun
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Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2016.03.008
Date:
May, 2016
File:
PDF, 1.54 MB
english, 2016
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