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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - A generalized model to predict fin-width roughness induced FinFET device variability using the boundary perturbation method
Sturtevant, John L., Capodieci, Luigi, Cheng, Qi, You, Jun, Chen, YijianVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2046221
File:
PDF, 1.13 MB
english, 2014