![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - A comparative study on the yield performance of via landing and direct stitching processes for 2D pattern connection
Capodieci, Luigi, Cain, Jason P., Zhou, Jun, Chen, YijianVolume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2219336
File:
PDF, 1.08 MB
english, 2016