Prediction of biases for optical proximity correction...

Journal of Micro/Nanolithography MEMS and MOEMS 2016 / 03 Vol. 15; Iss. 1

Prediction of biases for optical proximity correction through partial coherent identification

Jeong, Moongyu, Hahn, Jae W.
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Volume:
15
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.15.1.013509
Date:
March, 2016
File:
PDF, 3.54 MB
english, 2016
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