Mitigation of mask three-dimensional induced phase effects...

Journal of Micro/Nanolithography MEMS and MOEMS 2016 / 05 Vol. 15; Iss. 2

Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF i and extreme ultraviolet lithography

Finders, Jo, Winter, Laurens de, Last, Thorsten
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Volume:
15
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.15.2.021408
Date:
May, 2016
File:
PDF, 6.91 MB
english, 2016
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