Correlation between the macroscopic ferroelectric material properties of Si:HfO 2 and the statistics of 28 nm FeFET memory arrays
Mueller, S., Slesazeck, S., Henker, S., Flachowsky, S., Polakowski, P., Paul, J., Smith, E., Müller, J., Mikolajick, T.Volume:
497
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150193.2016.1162021
Date:
June, 2016
File:
PDF, 953 KB
english, 2016