SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials
Behringer, Uwe F. W., Huebner, Uwe, Falkner, Matthias, Zeitner, Uwe D., Banasch, Michael, Dietrich, Kay, Kley, Ernst-BernhardVolume:
9231
Year:
2014
Language:
english
DOI:
10.1117/12.2065944
File:
PDF, 3.06 MB
english, 2014