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SPIE Proceedings [SPIE Photomask Japan 2016 - Yokohama, Japan (Wednesday 6 April 2016)] Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology - High resolution hole patterning with EB lithography for NIL template production
Yoshioka, Nobuyuki, Tanabe, Mana, Yagawa, Keisuke, Motokawa, Takeharu, Hagihara, Kazuki, Suenaga, Machiko, Saito, Masato, Kanamitsu, Shingo, Itoh, MasamitsuVolume:
9984
Year:
2016
Language:
english
DOI:
10.1117/12.2242363
File:
PDF, 827 KB
english, 2016