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SPIE Proceedings [SPIE Photomask Japan 2016 - Yokohama, Japan (Wednesday 6 April 2016)] Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology - Novel EUV mask black border suppressing EUV and DUV OoB light reflection
Yoshioka, Nobuyuki, Ito, Shin, Kodera, Yutaka, Fukugami, Norihito, Komizo, Toru, Maruyama, Shingo, Watanabe, Genta, Yoshida, Itaru, Kotani, Jun, Konishi, Toshio, Haraguchi, TakashiVolume:
9984
Year:
2016
Language:
english
DOI:
10.1117/12.2242624
File:
PDF, 3.39 MB
english, 2016