Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography
Kim, Guk-Jin, Kim, In-Seon, Yeung, Michael, Oh, Hye-KeunVolume:
15
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.15.2.023503
Date:
May, 2016
File:
PDF, 1.47 MB
english, 2016