Eco-friendly photolithography using water-developable pure...

RSC Advances 2016 Vol. 6; Iss. 45

Eco-friendly photolithography using water-developable pure silk fibroin

Park, Joonhan, Lee, Sung-Gyu, Marelli, Benedetto, Lee, Myungjae, Kim, Taehyung, Oh, Hye-Keun, Jeon, Heonsu, Omenetto, Fiorenzo G., Kim, Sunghwan
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Volume:
6
Year:
2016
Language:
english
Journal:
RSC Adv.
DOI:
10.1039/c6ra04516b
File:
PDF, 596 KB
english, 2016
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