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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Improving lithographic performance for 32 nm
Busch, Jens, Raymond, Christopher J., Parge, Anne, Seltmann, Rolf, Scholtz, Heike, Schultz, Bernd, Knappe, Uwe, Ruhm, Matthias, Noot, Marc, Woischke, Dieter, Luehrmann, PaulVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.848613
File:
PDF, 3.91 MB
english, 2010