Volatile Metal Alkylamides Serve as Precursors for Vapor...

MRS Bulletin 2001 / 9 Vol. 26; Iss. 9

Volatile Metal Alkylamides Serve as Precursors for Vapor Deposition of High-Dielectric-Constant Gate Insulator Materials

Maye, Mathew M.
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Volume:
26
Language:
english
Journal:
MRS Bulletin
DOI:
10.1557/mrs2001.185
Date:
September, 2001
File:
PDF, 153 KB
english, 2001
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