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In Situ Study of Isothermal Strain Relaxation in Si-Ge Heteroepitaxial Films Using Substrate Curvature Measurements
Gillard, Véronique T., Noble, David B., Nix, William D.Volume:
239
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-239-395
Date:
January, 1991
File:
PDF, 419 KB
english, 1991