Properties and Production Mechanism of Low-Temperature...

MRS Proceedings 1992 / 1 Vol. 283

Properties and Production Mechanism of Low-Temperature Deposited CAT-CVD Poly-Silicon films

Matsumura, Hideki, Hosoda, Yoichi, Furukawa, Seijiro
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Volume:
283
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-283-623
Date:
January, 1992
File:
PDF, 288 KB
english, 1992
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