Observation of Reduced Oxidation Rates for Plasmaassisted...

MRS Proceedings 1993 / 1 Vol. 309

Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films

Ding, P. J., Zheng, B., Eisenbraun, E. T., Lanford, W. A., Kaloyeros, A. E., Hymes, S., Murarka, S. P.
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Volume:
309
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-309-455
Date:
January, 1993
File:
PDF, 263 KB
english, 1993
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