An Important Failure Mechanism in MOCVD (Ba,Sr)TiO3 thin...

MRS Proceedings 1997 / 1 Vol. 493

An Important Failure Mechanism in MOCVD (Ba,Sr)TiO3 thin Films: Resistance Degradation

Basceri, C., Lash, S. E., Parker, C. B., Streiffer, S. K., Kingon, A. I., Grossmann, M., Hoffmann, S., Schumacher, M., Waser, R., Bilodeau, S., Carlt, R., Van Buskirk, P. C., Summerfelt, S. R.
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Volume:
493
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-493-9
Date:
January, 1997
File:
PDF, 435 KB
english, 1997
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