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Influence of Plasma Chemistry on the Properties of Amorphous (Si,Ge) Alloy Devices
Dalal, Vikram L., Maxson, Tim, Haroon, SohailVolume:
507
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-507-441
Date:
January, 1998
File:
PDF, 308 KB
english, 1998