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Deposition Kinetics and Microstructural Evolution in Sputtered TA Films: a Real-Time/In-Situ Study
Whitacre, J. F., Yalisove, S. M., Bilello, J. C.Volume:
562
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-562-141
Date:
January, 1999
File:
PDF, 922 KB
english, 1999