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Growth of high quality n-Al0.5Ga0.5N thick films by MOCVD
He, Chenguang, Qin, Zhixin, Xu, Fujun, Zhang, Lisheng, Wang, Mingxing, Hou, Mengjun, Guo, Weiwei, Zhang, Shan, Wang, Xinqiang, Shen, BoVolume:
176
Language:
english
Journal:
Materials Letters
DOI:
10.1016/j.matlet.2016.04.150
Date:
August, 2016
File:
PDF, 1.33 MB
english, 2016