HAADF Imaging and Low-Loss EELS Investigation of HfO2/TiN...

HAADF Imaging and Low-Loss EELS Investigation of HfO2/TiN Interfaces in High-k Gate Stacks

Agustin, M P, Fonseca, L R C, Hooker, J H, Stemmer, S
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Volume:
11
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927605504458
Date:
August, 2005
File:
PDF, 1.32 MB
english, 2005
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