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In-situ Low Energy Argon Ion Milling of Nanoelectronic Structures Using a Triple Beam System
Stegmann, H, Ritz, Y, Utess, D, Engelmann, H-J, Zschech, EVolume:
15
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927609094021
Date:
July, 2009
File:
PDF, 393 KB
english, 2009