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A EELS Sub Nanometer Investigation of the Dielectric Gate Stack for the Realization of InGaAs Based MOSFET Devices
Longo, P, Holland, MC, Paterson, GW, Craven, AJ, Thayne, IGVolume:
15
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927609094458
Date:
July, 2009
File:
PDF, 934 KB
2009